Ibaraki University's
College of Engineering
Department of Biomolecular Functional Engineering

顔写真
Professor

YAMAUCHI Satoshi


Career

  1. Oki Electric Industry Co., Ltd. 1991/04-1997/03
  2. Ibaraki Univeristy 1997/04-Present

Academic background

  1. Tohoku University Faculty of Engineering Department of Electronic Engineering 1986 Graduated
  2. Tohoku University Graduate School, Division of Engineering Electronic Engineering Master course 1988 Completed
  3. Tohoku University Graduate School, Division of Engineering Electronic Engineering Doctor course 1991 Completed

Academic degrees

  1. Dr. Engineering Tohoku University

Current state of research and teaching activities

Plasma-assisted epitaxial growth of semiconductors
Epitaxial growth of ZnO film
Research for synthesis processes of Titanium-oxide
Research of photo-induced catalysis
Research of hydrophilicity
Reseach of THz-devices

Research Areas

  1. Electronic and Electric Materials Engineering
  2. "Function, Properties and Materials in Chemistry"
  3. "Solid‐State Physics I (Optical Properties, Semiconductor and Dielectrics)"
  4. Electron Devices and Apparatus Engineering

Research keywords

  1. Plasma Processing, Hetero-epitaxial growth, Zinc-Oxide film, Titanium-Oxide film, Light-emitting devices, Photo-Catalist, Super-hydrophilicity
  2. 銅薄膜の気相選択形成

Subject of research

  1. Hetero-epitaxial growth of ZnO layer 1998-Present
  2. Growth of Titanium-Oxide layer 1999-Present
  3. Hydrophilic coating 2001-Present
  4. 微細加工デバイス作製用Cuの気相選択形成 2015/04/01-Present

Bibliography

  1. ディスプレイ・光学部材における薄膜製造技術 情報機構 2007/08/30 978-4-901677-83-7 ディスプレイ・光学部材の薄膜製造技術についてまとめたハンドブックにてプラズマCVDによる酸化チタン薄膜の形成法について解説

Papers

  1. Research paper (scientific journal) Joint Enhanced Photo-Induced Property of LPCVD-TiO2 Layer on PCVD-TiOx Initial Layer Satoshi Yamauchi, Keisuke Yamamoto, Sakura Hatakeyama Journal of Materials Science and Chemical Engineering 3/ 7, 28-38 2015/06/18 10.4236/msce.2015.37004
  2. Research paper (scientific journal) Joint Drastic Resistivity Reduction of CVD-TiO2 Layers by Post-Wet-Treatment in HCl Solution Satoshi Yamauchi, Kazuhiro Ishibashi, Sakura Hatakeyama Journal of Crystallization Process and Technology 5, 24-30 2015/01/16 10.4236/jcpt.2015.51004
  3. Research paper (scientific journal) Joint Low Resistive TiO Deposition by LPCVD Using TTIP and NbF5 in Hydrogen-Ambient Satoshi Yamauchi, Kazuhiro Ishibashi, Sakura Hatakeyama Journal of Crystallization Process and Technology 5, 12-23 2015/01/12 10.4236/jcpt.2015.51003
  4. Research paper (scientific journal) Joint Low Pressure Chemical Vapor Deposition of TiO2 Layer in Hydrogen-Ambient Satoshi Yamauchi, Kazuhiro Ishibashi, Sakura Hatakeyama Journal of Crystallization Process and Technology 4, 185-192 2014/10/07 10.4236/jcpt.2014.44023
  5. Research paper (scientific journal) Joint Low Pressure Chemical Vapor Deposition of Nb and F Co-Doped TiO2 Layer Satoshi Yamauchi, Shouta Saiki, Kazuhiro Ishibashi, Akie Nakagawa, Sakura Hatakeyama Journal of Crystallization Process and Technology 4/ 2, 79-88 2014/04/03 10.4236/jcpt.2014.42011

Research presentations

  1. Poster presentation CuIを原料とするLPCVD法による選択的なCu堆積Ⅱ 第25回電気学会東京支部茨城支所研究発表会 2017/11/18
  2. Poster presentation 低圧化学気相堆積法を用いた高効率な光触媒性を有する酸化チタン薄膜の形成 第25回電気学会東京支部茨城支所研究発表会 2017/11/18
  3. Poster presentation αーラクトースによるTHz波発振特性 第25回電気学会東京支部茨城支所研究発表会 2017/11/18
  4. Oral presentation(invited, special) ヨウ化銅のみを原料とする銅の気相選択成長 TSV応用研究会 2016/10/04
  5. Poster presentation 配向性制御によるアナターゼTiO2光触媒性の高効率化 第23回電気学会東京支部茨城支所研究発表会 2015/11/28

Intellectual property rights

  1. 水の分解方法及びその装置 特願2001-63342 2001/03/07 特開2002-266089
  2. Patent テラヘルツ波を用いた異物検査装置及びその方法 2013/06/21 6061197 2016/12/22
  3. Patent テラヘルツ電磁波を用いた試料の構造分析方法およびテラヘルツ電磁波を用いた試料の構造分析装置 特願2008-39555 2008/02/21 特開2009-198278 特許第4817336 2011/09/09
  4. 半導体素子の製造方法 平成06年特許願第218743号 1994/09/13 特許第3283703号 2002/03/01
  5. FABRICATING METHOD FOR SEMICONDUCTOR DEVICE US 6,284,587 B1 2001/09/04

Prizes

  1. Materials Research Society Graduate Student Awards 1989

Memberships of academic societies

  1. Materials Research Society (MRS)
  2. The Institute of Electrical and Electronics Engineers (IEEE)
  3. The Japan Society of Applied Physics
  4. 材料技術研究協会 2010/01/01-Present